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SAQP and EUV block patterning of BEOL metal layers on IMEC's iN7 platform

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dc.contributor.authorBekaert, Joost
dc.contributor.authorDi Lorenzo, Paolo
dc.contributor.authorMao, Ming
dc.contributor.authorDecoster, Stefan
dc.contributor.authorLariviere, Stephane
dc.contributor.authorFranke, Joern-Holger
dc.contributor.authorBlanco, Victor
dc.contributor.authorKutrzeba Kotowska, Bogumila
dc.contributor.authorLazzarino, Frederic
dc.contributor.authorGallagher, Emily
dc.contributor.authorHendrickx, Eric
dc.contributor.authorLeray, Philippe
dc.contributor.authorKim, Ryan Ryoung han
dc.contributor.authorMcIntyre, Greg
dc.contributor.authorColsters, Paul
dc.contributor.authorWittebrood, Friso
dc.contributor.authorvan Dijk, Joep
dc.contributor.authorMaslow, Mark
dc.contributor.authorTimoshkov, Vadim
dc.contributor.authorKiers, Ton
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorMao, Ming
dc.contributor.imecauthorDecoster, Stefan
dc.contributor.imecauthorLariviere, Stephane
dc.contributor.imecauthorFranke, Joern-Holger
dc.contributor.imecauthorBlanco, Victor
dc.contributor.imecauthorKutrzeba Kotowska, Bogumila
dc.contributor.imecauthorLazzarino, Frederic
dc.contributor.imecauthorGallagher, Emily
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorLeray, Philippe
dc.contributor.imecauthorKim, Ryan Ryoung han
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.contributor.orcidimecDecoster, Stefan::0000-0003-1162-9288
dc.contributor.orcidimecFranke, Joern-Holger::0000-0002-3571-1633
dc.contributor.orcidimecLazzarino, Frederic::0000-0001-7961-9727
dc.contributor.orcidimecGallagher, Emily::0000-0002-2927-8298
dc.date.accessioned2021-10-24T02:56:53Z
dc.date.available2021-10-24T02:56:53Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/27819
dc.identifier.urlhttps://www.spiedigitallibrary.org/conference-proceedings-of-spie/10143/1/SAQP-and-EUV-block-patterning-of-BEOL-metal-layers-on/
dc.source.beginpage101430H
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography VIII
dc.source.conferencedate27/02/2017
dc.source.conferencelocationSan Jose, CA United States
dc.title

SAQP and EUV block patterning of BEOL metal layers on IMEC's iN7 platform

dc.typeProceedings paper
dspace.entity.typePublication
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