Publication:

3D FinFET gate etch for advanced CMOS scaling

Date

2019
Presentation
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dc.contributor.authorDupuy, Emmanuel
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.authorMarinov, Daniil
dc.contributor.authorHody, Hubert
dc.contributor.authorMertens, Hans
dc.contributor.authorSiew, Yong Kong
dc.contributor.authorDemuynck, Steven
dc.contributor.authorHoriguchi, Naoto
dc.contributor.imecauthorDupuy, Emmanuel
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.imecauthorHody, Hubert
dc.contributor.imecauthorMertens, Hans
dc.contributor.imecauthorSiew, Yong Kong
dc.contributor.imecauthorDemuynck, Steven
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.orcidimecDupuy, Emmanuel::0000-0003-3341-1618
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.date.accessioned2021-10-27T08:59:07Z
dc.date.available2021-10-27T08:59:07Z
dc.date.issued2019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/32922
dc.identifier.urlhttp://pesm2019.insight-outside.fr/index.php?langue=en&onglet=11&acces=&idUser=&emailUser=&messageConfirmation=
dc.source.conference11th PESM
dc.source.conferencedate20/05/2019
dc.source.conferencelocationGrenoble France
dc.title

3D FinFET gate etch for advanced CMOS scaling

dc.typeOral presentation
dspace.entity.typePublication
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