Publication:

Evolution of roughness during the pattern transfer of high-chi, 10 nm half-pitch, silicon-containing block copolymer structures

Date

2018
Proceedings Paper
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dc.contributor.authorBlachut, Gregory
dc.contributor.authorSirard, Stephen
dc.contributor.authorLiang, Andrew
dc.contributor.authorMack, Chris
dc.contributor.authorMaher, Michael
dc.contributor.authorRincon Delgadillo, Paulina
dc.contributor.authorChan, BT
dc.contributor.authorMannaert, Geert
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorWillson, Grant
dc.contributor.authorEllison, Christopher
dc.contributor.authorHymes, Diane
dc.contributor.imecauthorRincon Delgadillo, Paulina
dc.contributor.imecauthorChan, BT
dc.contributor.imecauthorMannaert, Geert
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.orcidimecChan, BT::0000-0003-2890-0388
dc.date.accessioned2021-10-25T16:45:58Z
dc.date.available2021-10-25T16:45:58Z
dc.date.embargo9999-12-31
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/30258
dc.identifier.urlhttps://doi.org/10.1117/12.2297489
dc.source.beginpage1058907
dc.source.conferenceAdvanced Etch Technology for Nanopatterning VII
dc.source.conferencedate25/02/2018
dc.source.conferencelocationSan Jose, CA USA
dc.title

Evolution of roughness during the pattern transfer of high-chi, 10 nm half-pitch, silicon-containing block copolymer structures

dc.typeProceedings paper
dspace.entity.typePublication
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