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Assessment of tunnel oxide and poly-Si channel traps in 3D SONOS memory before and after P/E cycling
Publication:
Assessment of tunnel oxide and poly-Si channel traps in 3D SONOS memory before and after P/E cycling
Date
2015
Journal article
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Lee, Ko-Hui
;
Degraeve, Robin
;
Toledano Luque, Maria
;
Arreghini, Antonio
;
Breuil, Laurent
;
Blomme, Pieter
;
Van den Bosch, Geert
;
Van Houdt, Jan
Journal
Microelectronic Engineering
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1973
since deposited on 2021-10-22
Acq. date: 2025-10-23
Citations
Metrics
Views
1973
since deposited on 2021-10-22
Acq. date: 2025-10-23
Citations