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Assessment of Transistor Aging Models in a 28nm CMOS Technology at a Wide Range of Stress Conditions

 
dc.contributor.authorSangani, Dishant
dc.contributor.authorDiaz Fortuny, Javier
dc.contributor.authorBury, Erik
dc.contributor.authorKaczer, Ben
dc.contributor.authorGielen, G.
dc.contributor.imecauthorSangani, Dishant
dc.contributor.imecauthorDiaz Fortuny, Javier
dc.contributor.imecauthorBury, Erik
dc.contributor.imecauthorKaczer, Ben
dc.contributor.orcidimecDiaz Fortuny, Javier::0000-0002-8186-071X
dc.contributor.orcidimecBury, Erik::0000-0002-5847-3949
dc.contributor.orcidimecKaczer, Ben::0000-0002-1484-4007
dc.date.accessioned2023-06-01T12:17:58Z
dc.date.available2023-05-26T19:52:18Z
dc.date.available2023-06-01T12:17:58Z
dc.date.issued2022
dc.identifier.doi10.1109/IIRW56459.2022.10032756
dc.identifier.eisbn978-1-6654-5368-4
dc.identifier.issn1930-8841
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/41648
dc.publisherIEEE
dc.source.conferenceIEEE International Integrated Reliability Workshop (IIRW)
dc.source.conferencedateOCT 09-14, 2022
dc.source.conferencelocationSouth Lake Tahoe
dc.source.journalna
dc.source.numberofpages6
dc.title

Assessment of Transistor Aging Models in a 28nm CMOS Technology at a Wide Range of Stress Conditions

dc.typeProceedings paper
dspace.entity.typePublication
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