Publication:

Challenges and solutions of replacement metal gate patterning to enable gate-all-around device scaling

Date

2021
Proceedings Paper
Simple item page Full metadata Statistics
 
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.orcid0000-0002-6619-1327
cris.virtual.orcid0000-0001-5490-0416
cris.virtual.orcid0000-0003-1057-8140
cris.virtual.orcid0009-0002-2123-452X
cris.virtual.orcid0000-0003-4778-5709
cris.virtual.orcid0009-0000-0890-8820
cris.virtual.orcid0000-0003-2890-0388
cris.virtual.orcid#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.orcid0000-0003-0333-376X
cris.virtual.orcid0000-0003-3235-6055
cris.virtual.orcid0009-0008-0186-6101
cris.virtualsource.department83f65a25-48f3-4301-bc68-696e60828f39
cris.virtualsource.department9f04b13f-f81c-4d48-a5bd-0b2cb5210392
cris.virtualsource.departmentee7e6e4c-3b87-41b4-9995-a519c69c638e
cris.virtualsource.department89163bc6-d5be-4efa-ab7b-2ff202adf9e0
cris.virtualsource.department30e0d104-74ca-43d2-a6b2-a2552c9bca3a
cris.virtualsource.department65e35b50-3856-474e-99bc-3b8dc48e80a7
cris.virtualsource.department23ab4d34-06a5-49b7-a9f7-dc9611089503
cris.virtualsource.departmentbe708c5c-a9e8-4fce-ac31-bfe5c6d69ee1
cris.virtualsource.department35854b77-4a46-44ca-a4d5-cde46856028b
cris.virtualsource.departmentc0e5c06a-f569-4f62-a5cf-b14572adec89
cris.virtualsource.departmentceacc897-9287-45a3-a49c-2ae1210a4fd5
cris.virtualsource.orcid83f65a25-48f3-4301-bc68-696e60828f39
cris.virtualsource.orcid9f04b13f-f81c-4d48-a5bd-0b2cb5210392
cris.virtualsource.orcidee7e6e4c-3b87-41b4-9995-a519c69c638e
cris.virtualsource.orcid89163bc6-d5be-4efa-ab7b-2ff202adf9e0
cris.virtualsource.orcid30e0d104-74ca-43d2-a6b2-a2552c9bca3a
cris.virtualsource.orcid65e35b50-3856-474e-99bc-3b8dc48e80a7
cris.virtualsource.orcid23ab4d34-06a5-49b7-a9f7-dc9611089503
cris.virtualsource.orcidbe708c5c-a9e8-4fce-ac31-bfe5c6d69ee1
cris.virtualsource.orcid35854b77-4a46-44ca-a4d5-cde46856028b
cris.virtualsource.orcidc0e5c06a-f569-4f62-a5cf-b14572adec89
cris.virtualsource.orcidceacc897-9287-45a3-a49c-2ae1210a4fd5
dc.contributor.authorOniki, Yusuke
dc.contributor.authorRagnarsson, Lars-Ake
dc.contributor.authorHideaki, Iino
dc.contributor.authorCott, Daire
dc.contributor.authorChan, BT
dc.contributor.authorSebaai, Farid
dc.contributor.authorHopf, Toby
dc.contributor.authorDekkers, Harold
dc.contributor.authorDentoni Litta, Eugenio
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.authorHolsteyns, Frank
dc.contributor.authorHoriguchi, Naoto
dc.contributor.imecauthorOniki, Yusuke
dc.contributor.imecauthorRagnarsson, Lars-Ake
dc.contributor.imecauthorHideaki, Iino
dc.contributor.imecauthorCott, Daire
dc.contributor.imecauthorChan, BT
dc.contributor.imecauthorSebaai, Farid
dc.contributor.imecauthorHopf, Toby
dc.contributor.imecauthorDekkers, Harold
dc.contributor.imecauthorDentoni Litta, Eugenio
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.orcidimecOniki, Yusuke::0000-0002-6619-1327
dc.contributor.orcidimecRagnarsson, Lars-Ake::0000-0003-1057-8140
dc.contributor.orcidimecChan, BT::0000-0003-2890-0388
dc.contributor.orcidimecDekkers, Harold::0000-0003-4778-5709
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.contributor.orcidimecDentoni Litta, Eugenio::0000-0003-0333-376X
dc.date.accessioned2021-10-31T10:13:14Z
dc.date.available2021-10-31T10:13:14Z
dc.date.issued2021
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/37028
dc.identifier.urlhttps://doi.org/10.4028/www.scientific.net/SSP.314.119
dc.source.beginpage119
dc.source.conferenceInternational Symposium on Ultra Clean Processing of Semiconductor Surfaces - UCPSS
dc.source.conferencedate22/09/2020
dc.source.conferencelocationMechelen Belgium
dc.source.endpage126
dc.title

Challenges and solutions of replacement metal gate patterning to enable gate-all-around device scaling

dc.typeProceedings paper
dspace.entity.typePublication
Files
Publication available in collections:
Conference contributions