Publication:

Alternative EUV multilayer mirror mask for reduced mask 3D effects evaluated at NA0.33

Date

2025

Proceedings Paper

https://doi.org/10.1117/12.3071379

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Author(s)

Kovalevich, Tatiana

;

;

Libeert, Guillaume

;

Van Look, Lieve

;

Frommhold, Andreas

;

Philipsen, Vicky

;

;

Fujimura, Yukihiro

;

;

;

Yamaji, Masataka

;

Tomizuka, Shosuke

;

Yoshikawa, Shingo

Journal

PHOTOMASK TECHNOLOGY 2025

Statistics

2 since deposited on 2026-03-31

Acq. date: 2026-04-06