Publication:
Alternative EUV multilayer mirror mask for reduced mask 3D effects evaluated at NA0.33
| dc.contributor.author | Kovalevich, Tatiana | |
| dc.contributor.author | Pellens, Nick | |
| dc.contributor.author | Libeert, Guillaume | |
| dc.contributor.author | Van Look, Lieve | |
| dc.contributor.author | Frommhold, Andreas | |
| dc.contributor.author | Philipsen, Vicky | |
| dc.contributor.author | Abe, Tsukasa | |
| dc.contributor.author | Fujimura, Yukihiro | |
| dc.contributor.author | Hotei, Izumi | |
| dc.contributor.author | Ebisawa, Mei | |
| dc.contributor.author | Yamaji, Masataka | |
| dc.contributor.author | Tomizuka, Shosuke | |
| dc.contributor.author | Yoshikawa, Shingo | |
| dc.date.accessioned | 2026-03-31T07:57:35Z | |
| dc.date.available | 2026-03-31T07:57:35Z | |
| dc.date.createdwos | 2026-02-20 | |
| dc.date.issued | 2025 | |
| dc.description.wosFundingText | The authors thank Imec LithoRise team and DNP experts for fruitful discussions. We also thank imec OPC team and ARCaDi software, together with Brion MXP and Synopsis S-Litho_EUV simulation and data analysis tools for facilitation of this study. This work has been enabled in part by the NanoIC pilot line. The acquisition and operation are jointly funded by the Chips Joint Undertaking, through the European Union's Digital Europe (101183266) and Horizon Europe programs (101183277), as well as by the participating states Belgium (Flanders), France, Germany, Finland, Ireland and Romania. For more information, visit nanoic-project.eu. | |
| dc.identifier.doi | 10.1117/12.3071379 | |
| dc.identifier.isbn | 978-1-5106-9320-3 | |
| dc.identifier.issn | 0277-786X | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/58978 | |
| dc.language.iso | eng | |
| dc.provenance.editstepuser | greet.vanhoof@imec.be | |
| dc.publisher | SPIE-INT SOC OPTICAL ENGINEERING | |
| dc.source.beginpage | 1368711 | |
| dc.source.conference | Photomask Technology | |
| dc.source.conferencedate | 2025-09-22 | |
| dc.source.conferencelocation | Monterey | |
| dc.source.journal | PHOTOMASK TECHNOLOGY 2025 | |
| dc.source.numberofpages | 10 | |
| dc.title | Alternative EUV multilayer mirror mask for reduced mask 3D effects evaluated at NA0.33 | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| imec.internal.crawledAt | 2026-02-23 | |
| imec.internal.source | crawler | |
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