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The use of ion implantation and annealing for the fabrication of strained silicon on thin SiGe virtual substrates
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2 since deposited on 2021-10-15
Acq. date: 2025-10-24
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1885 since deposited on 2021-10-15
Acq. date: 2025-10-24
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2 since deposited on 2021-10-15
Acq. date: 2025-10-24
Views
1885 since deposited on 2021-10-15
Acq. date: 2025-10-24
Citations