Publication:

SIMS Analysis of Thin EUV Photoresist Films

Date

2022
Journal article
https://doi.org/10.1021/acs.analchem.1c04012
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dc.contributor.authorSpampinato, Valentina
dc.contributor.authorFranquet, Alexis
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorPollentier, Ivan
dc.contributor.authorPirkl, Alexander
dc.contributor.authorOka, Hironori
dc.contributor.authorvan der Heide, Paul
dc.contributor.imecauthorSpampinato, Valentina
dc.contributor.imecauthorFranquet, Alexis
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorvan der Heide, Paul
dc.contributor.orcidimecSpampinato, Valentina::0000-0003-3225-6740
dc.contributor.orcidimecFranquet, Alexis::0000-0002-7371-8852
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.contributor.orcidimecvan der Heide, Paul::0000-0001-6292-0329
dc.date.accessioned2022-03-31T12:07:13Z
dc.date.available2022-03-26T02:08:17Z
dc.date.available2022-03-30T07:20:58Z
dc.date.available2022-03-31T12:07:13Z
dc.date.issued2022
dc.identifier.doi10.1021/acs.analchem.1c04012
dc.identifier.issn0003-2700
dc.identifier.pmidMEDLINE:35076209
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/39522
dc.publisherAMER CHEMICAL SOC
dc.source.beginpage2408
dc.source.endpage2415
dc.source.issue5
dc.source.journalANALYTICAL CHEMISTRY
dc.source.numberofpages8
dc.source.volume94
dc.subject.keywordsLATERAL RESOLUTION
dc.subject.keywordsMASS
dc.title

SIMS Analysis of Thin EUV Photoresist Films

dc.typeJournal article
dspace.entity.typePublication
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