Publication:
A comparative study of copper drift diffusion in plasma deposited a-SiC : H and Silicon Nitride
Date
| dc.contributor.author | Lanckmans, Filip | |
| dc.contributor.author | Gray, William | |
| dc.contributor.author | Brijs, Bert | |
| dc.contributor.author | Maex, Karen | |
| dc.contributor.imecauthor | Maex, Karen | |
| dc.date.accessioned | 2021-10-14T17:13:26Z | |
| dc.date.available | 2021-10-14T17:13:26Z | |
| dc.date.issued | 2001 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/5429 | |
| dc.source.beginpage | 329 | |
| dc.source.endpage | 335 | |
| dc.source.issue | 1_4 | |
| dc.source.journal | Microelectronic Engineering | |
| dc.source.volume | 55 | |
| dc.title | A comparative study of copper drift diffusion in plasma deposited a-SiC : H and Silicon Nitride | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | ||
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