Publication:

Influence of the Ge-concentration and RTA on the device performance of strained Si/SiGe pMOS devices

Date

2002

Proceedings Paper

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Files

6311.pdf 308.41 KB

Author(s)

Collaert, Nadine

;

Verheyen, Peter

;

De Meyer, Kristin

;

;

Statistics

1805 since deposited on 2021-10-14

Acq. date: 2026-05-15