Publication:

NXE:3400 OPC Process Monitoring: Model Validity vs. Process Variability

Date

2021-02-22
Proceedings Paper
https://doi.org/10.1117/12.2583870
Simple item page Full metadata Statistics
 
dc.contributor.authorXu, Dongbo
dc.contributor.authorRio, David
dc.contributor.authorGillijns, Werner
dc.contributor.authorDelorme, Max
dc.contributor.authorBaerts, Christina
dc.contributor.editorFelix, Nelson
dc.contributor.editorLio, Anna
dc.contributor.imecauthorXu, Dongbo
dc.contributor.imecauthorRio, David
dc.contributor.imecauthorGillijns, Werner
dc.contributor.imecauthorDelorme, Max
dc.contributor.imecauthorBaerts, Christina
dc.contributor.orcidimecXu, Dongbo::0000-0003-1159-2315
dc.contributor.orcidimecGillijns, Werner::0000-0002-2430-7360
dc.date.accessioned2022-06-24T07:53:46Z
dc.date.available2021-11-02T15:58:18Z
dc.date.available2022-05-17T07:51:43Z
dc.date.available2022-06-24T07:53:46Z
dc.date.issued2021-02-22
dc.identifier.doi10.1117/12.2583870
dc.identifier.eisbn978-1-5106-4052-8
dc.identifier.isbn978-1-5106-4051-1
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/37677
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.conferenceConference on Extreme Ultraviolet (EUV) Lithography XII
dc.source.conferencedateFEB 22-26, 2021
dc.source.conferencelocationonline
dc.source.journalna
dc.source.numberofpages11
dc.source.volume11609
dc.subject.disciplineNeurosciences & psychopharmacology
dc.subject.keywordsDesign Rule, Design Retarget, EUV Lithography, NTD Process, EUV Single Patterning
dc.title

NXE:3400 OPC Process Monitoring: Model Validity vs. Process Variability

dc.typeProceedings paper
dspace.entity.typePublication
Files

Original bundle

Name:
116091N.pdf
Size:
2.71 MB
Format:
Unknown data format
Description:
Published version
Download
Publication available in collections:
Conference contributions