Publication:
Plasma nitridation for atomic layer etching of Ni
| dc.contributor.author | Smith, Taylor G. | |
| dc.contributor.author | Abelgawad, Ali | |
| dc.contributor.author | de Marneffe, Jean-Francois | |
| dc.contributor.author | Chang, Jane P. | |
| dc.contributor.imecauthor | Abelgawad, Ali | |
| dc.contributor.imecauthor | de Marneffe, Jean-Francois | |
| dc.contributor.orcidimec | de Marneffe, Jean-Francois::0000-0001-5178-6670 | |
| dc.contributor.orcidimec | Abelgawad, Ali::0000-0002-2925-8641 | |
| dc.date.accessioned | 2024-09-09T10:30:31Z | |
| dc.date.available | 2024-02-11T17:06:51Z | |
| dc.date.available | 2024-09-09T10:30:31Z | |
| dc.date.issued | 2024 | |
| dc.description.wosFundingText | The authors acknowledge funding from the National Science Foundation Award Nos. 1805112 and 2212981. J.P.C. acknowledges the mentorship and support by Joe Greene within AVS. The authors acknowledge the use of instruments at the UCLA Nanolab, IMEC's 300 mm Pilot line for performing part of the operations needed for substrate preparation, as well as Xiaoyu Piao for optimizing the Ni deposition process. | |
| dc.identifier.doi | 10.1116/6.0003263 | |
| dc.identifier.issn | 0734-2101 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/43530 | |
| dc.publisher | A V S AMER INST PHYSICS | |
| dc.source.beginpage | Art. 022602 | |
| dc.source.endpage | N/A | |
| dc.source.issue | 2 | |
| dc.source.journal | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | |
| dc.source.numberofpages | 7 | |
| dc.source.volume | 42 | |
| dc.subject.keywords | NICKEL | |
| dc.subject.keywords | OXIDATION | |
| dc.subject.keywords | NITROGEN | |
| dc.subject.keywords | COPPER | |
| dc.title | Plasma nitridation for atomic layer etching of Ni | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
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