Publication:

HF etching mechanisms of advanced low-k films

Date

2014
Proceedings Paper
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dc.contributor.authorVerdonck, Patrick
dc.contributor.authorLe, Quoc Toan
dc.contributor.authorKrishtab, Mikhail
dc.contributor.authorVanstreels, Kris
dc.contributor.authorArmini, Silvia
dc.contributor.authorSimone, A.
dc.contributor.authorNguyen, Mai Phuong
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.imecauthorVerdonck, Patrick
dc.contributor.imecauthorLe, Quoc Toan
dc.contributor.imecauthorKrishtab, Mikhail
dc.contributor.imecauthorVanstreels, Kris
dc.contributor.imecauthorArmini, Silvia
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.orcidimecVerdonck, Patrick::0000-0003-2454-0602
dc.contributor.orcidimecLe, Quoc Toan::0000-0002-0206-6279
dc.contributor.orcidimecVanstreels, Kris::0000-0002-4420-0966
dc.contributor.orcidimecArmini, Silvia::0000-0003-0578-3422
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.date.accessioned2021-10-22T07:47:13Z
dc.date.available2021-10-22T07:47:13Z
dc.date.embargo9999-12-31
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24762
dc.identifier.urlhttp://ieeexplore.ieee.org/xpls/abs_all.jsp?arnumber=6831851&tag=1
dc.source.beginpage155
dc.source.conferenceIEEE International Interconnect Technology Conference / Advanced Metallization Conference - IITC/AMC
dc.source.conferencedate20/05/2014
dc.source.conferencelocationSan Jose, CA USA
dc.source.endpage158
dc.title

HF etching mechanisms of advanced low-k films

dc.typeProceedings paper
dspace.entity.typePublication
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