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Towards a complete description of line width roughness: a comparison of different methods for vertical and spatial LER and LWR analysis

Date

2004
Proceedings Paper
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dc.contributor.authorConstantoudis, Vassilis
dc.contributor.authorPatsis, George
dc.contributor.authorLeunissen, Peter
dc.contributor.authorGogolides, Evangelos
dc.date.accessioned2021-10-15T12:56:31Z
dc.date.available2021-10-15T12:56:31Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8719
dc.source.beginpage967
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XVIII
dc.source.conferencedate22/02/2004
dc.source.conferencelocationSanta Clara (CA) USA
dc.source.endpage977
dc.title

Towards a complete description of line width roughness: a comparison of different methods for vertical and spatial LER and LWR analysis

dc.typeProceedings paper
dspace.entity.typePublication
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