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Characterization of thin silicon films grown in a batch-type LP-CVD system

Date

2005
Proceedings Paper
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dc.contributor.authorVan Nieuwenhuysen, Kris
dc.contributor.authorVan Gestel, Dries
dc.contributor.authorKuzma Filipek, Izabela
dc.contributor.authorDuerinckx, Filip
dc.contributor.authorBeaucarne, Guy
dc.contributor.authorPoortmans, Jef
dc.contributor.imecauthorKuzma Filipek, Izabela
dc.contributor.imecauthorDuerinckx, Filip
dc.contributor.imecauthorPoortmans, Jef
dc.contributor.orcidimecDuerinckx, Filip::0000-0003-2570-7371
dc.contributor.orcidimecPoortmans, Jef::0000-0003-2077-2545
dc.date.accessioned2021-10-16T06:16:42Z
dc.date.available2021-10-16T06:16:42Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/11415
dc.source.beginpage1251
dc.source.conferenceProceedings of the 20th European Photovoltaic Solar Energy Conference and Exhibition
dc.source.conferencedate6/06/2005
dc.source.conferencelocationBarcelona Spain
dc.source.endpage1254
dc.title

Characterization of thin silicon films grown in a batch-type LP-CVD system

dc.typeProceedings paper
dspace.entity.typePublication
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