Continued dimensional scaling through projection lithography

dc.contributor.author	Ronse, Kurt
dc.contributor.imecauthor	Ronse, Kurt
dc.contributor.orcidimec	Ronse, Kurt::0000-0003-0803-4267
dc.date.accessioned	2025-01-21T11:15:20Z
dc.date.available	2024-07-16T18:13:21Z
dc.date.available	2025-01-21T11:15:20Z
dc.date.embargo	2024-06-03
dc.date.issued	2024
dc.description.wosFundingText	The author would like to thank the imec patterning teams (APPM) that have contributed to this work and enabled this article.
dc.identifier.doi	10.1016/j.mne.2024.100263
dc.identifier.issn	2590-0072
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/44165
dc.publisher	ELSEVIER
dc.source.beginpage	Art. 100263
dc.source.endpage	N/A
dc.source.issue	June
dc.source.journal	MICRO AND NANO ENGINEERING
dc.source.numberofpages	7
dc.source.volume	23
dc.subject.keywords	PHOTOLITHOGRAPHY
dc.subject.keywords	RESOLUTION
dc.title	Continued dimensional scaling through projection lithography
dc.type	Journal article review
dspace.entity.type	Publication
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