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Wet-chemical approaches for atomic layer etching of semiconductors: surface chemistry, oxide removal and reoxidation of InAs (100)
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Wet-chemical approaches for atomic layer etching of semiconductors: surface chemistry, oxide removal and reoxidation of InAs (100)
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Date
2015
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
van Dorp, Dennis
;
Arnauts, Sophia
;
Holsteyns, Frank
;
De Gendt, Stefan
Journal
ECS Journal of Solid State Science and Technology
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1856
since deposited on 2021-10-23
Acq. date: 2025-12-16
Citations
Metrics
Views
1856
since deposited on 2021-10-23
Acq. date: 2025-12-16
Citations