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ToFSIMS and XPS study of ion implanted 248nm deep ultraviolet (DUV) photoresist
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ToFSIMS and XPS study of ion implanted 248nm deep ultraviolet (DUV) photoresist
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Date
2011
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Franquet, Alexis
;
Tsvetanova, Diana
;
Conard, Thierry
;
Vos, Rita
;
Vereecke, Guy
;
Mertens, Paul
;
Heyns, Marc
;
Vandervorst, Wilfried
Journal
Microelectronic Engineering
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1825
since deposited on 2021-10-19
Acq. date: 2025-12-15
Citations
Metrics
Views
1825
since deposited on 2021-10-19
Acq. date: 2025-12-15
Citations