Publication:

ToFSIMS and XPS study of ion implanted 248nm deep ultraviolet (DUV) photoresist

Date

2011
Journal article
Simple item page Full metadata Statistics
 
dc.contributor.authorFranquet, Alexis
dc.contributor.authorTsvetanova, Diana
dc.contributor.authorConard, Thierry
dc.contributor.authorVos, Rita
dc.contributor.authorVereecke, Guy
dc.contributor.authorMertens, Paul
dc.contributor.authorHeyns, Marc
dc.contributor.authorVandervorst, Wilfried
dc.contributor.imecauthorFranquet, Alexis
dc.contributor.imecauthorTsvetanova, Diana
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecFranquet, Alexis::0000-0002-7371-8852
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.date.accessioned2021-10-19T13:37:57Z
dc.date.available2021-10-19T13:37:57Z
dc.date.embargo9999-12-31
dc.date.issued2011
dc.identifier.issn0167-9317
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18932
dc.source.beginpage677
dc.source.endpage679
dc.source.issue5
dc.source.journalMicroelectronic Engineering
dc.source.volume88
dc.title

ToFSIMS and XPS study of ion implanted 248nm deep ultraviolet (DUV) photoresist

dc.typeJournal article
dspace.entity.typePublication
Files

Original bundle

Name:
21568.pdf
Size:
469.08 KB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Articles