Skip to content
Institutional repository
Communities & Collections
Browse
Site
Log In
imec Publications
Articles
Metrology method for the correlation of line edge roughness for different resists before and after etch
Publication:
Metrology method for the correlation of line edge roughness for different resists before and after etch
Date
2001
Journal article
Simple item page
Full metadata
Statistics
Loading...
Loading...
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Winkelmeier, Stephanie
;
Sarstedt, Margit
;
Ercken, Monique
;
Goethals, Mieke
;
Ronse, Kurt
Journal
Microelectronic Engineering
Abstract
Description
Metrics
Views
1948
since deposited on 2021-10-14
Acq. date: 2025-10-24
Citations
Metrics
Views
1948
since deposited on 2021-10-14
Acq. date: 2025-10-24
Citations