Metrology method for the correlation of line edge roughness for different resists before and after etch

dc.contributor.author	Winkelmeier, Stephanie
dc.contributor.author	Sarstedt, Margit
dc.contributor.author	Ercken, Monique
dc.contributor.author	Goethals, Mieke
dc.contributor.author	Ronse, Kurt
dc.contributor.imecauthor	Ercken, Monique
dc.contributor.imecauthor	Ronse, Kurt
dc.contributor.orcidimec	Ronse, Kurt::0000-0003-0803-4267
dc.date.accessioned	2021-10-14T18:24:39Z
dc.date.available	2021-10-14T18:24:39Z
dc.date.issued	2001
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/5838
dc.source.beginpage	665
dc.source.endpage	672
dc.source.issue	1_4
dc.source.journal	Microelectronic Engineering
dc.source.volume	57-58
dc.title	Metrology method for the correlation of line edge roughness for different resists before and after etch
dc.type	Journal article
dspace.entity.type	Publication
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