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Hafnium oxide films by atomic layer deposition for high-k gate dielectric applications: analysis of the density of nanometer-thin films
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2095 since deposited on 2021-10-16
1last month
Acq. date: 2026-01-26
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Views
2095 since deposited on 2021-10-16
1last month
Acq. date: 2026-01-26
Citations