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Hafnium oxide films by atomic layer deposition for high-k gate dielectric applications: analysis of the density of nanometer-thin films
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2102 since deposited on 2021-10-16
3last month
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Acq. date: 2026-08-09
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Statistics
Views
2102 since deposited on 2021-10-16
3last month
1last week
Acq. date: 2026-08-09
Citations