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Comprehensive study of the fabrication of SGOI substrates by the Ge condensation technique: oxidation kinetics and relaxation mechanism
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Comprehensive study of the fabrication of SGOI substrates by the Ge condensation technique: oxidation kinetics and relaxation mechanism
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Date
2009
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Souriau, Laurent
;
Wang, Gang
;
Loo, Roger
;
Caymax, Matty
;
Meuris, Marc
;
Heyns, Marc
;
Vandervorst, Wilfried
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1910
since deposited on 2021-10-18
Acq. date: 2025-12-15
Citations
Metrics
Views
1910
since deposited on 2021-10-18
Acq. date: 2025-12-15
Citations