Publication:

Extend 0.33 NA extreme ultraviolet single patterning to pitch 28-nm metal design by low-n mask

Date

2022-11-25
Journal article
https://doi.org/10.1117/1.JMM.21.4.043202
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Author(s)

Xu, Dongbo  
;
Gillijns, Werner  
;
Tan, Ling Ee  
;
Rio, David
;
Delorme, Max
;
Philipsen, Vicky  
;
Kim, Ryan Ryoung han

Journal

JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3

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