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Extend 0.33 NA extreme ultraviolet single patterning to pitch 28-nm metal design by low-n mask
Publication:
Extend 0.33 NA extreme ultraviolet single patterning to pitch 28-nm metal design by low-n mask
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Date
2022-11-25
Journal article
https://doi.org/10.1117/1.JMM.21.4.043202
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Xu, Dongbo
;
Gillijns, Werner
;
Tan, Ling Ee
;
Rio, David
;
Delorme, Max
;
Philipsen, Vicky
;
Kim, Ryan Ryoung han
Journal
JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3
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Metrics
Downloads
464
since deposited on 2023-03-01
43
last month
9
last week
Acq. date: 2025-12-12
Views
1369
since deposited on 2023-03-01
Acq. date: 2025-12-12
Citations