Publication:

Extend 0.33 NA extreme ultraviolet single patterning to pitch 28-nm metal design by low-n mask

Date

2022-11-25
Journal article
https://doi.org/10.1117/1.JMM.21.4.043202
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dc.contributor.authorXu, Dongbo
dc.contributor.authorGillijns, Werner
dc.contributor.authorTan, Ling Ee
dc.contributor.authorRio, David
dc.contributor.authorDelorme, Max
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorKim, Ryan Ryoung han
dc.contributor.imecauthorXu, Dongbo
dc.contributor.imecauthorGillijns, Werner
dc.contributor.imecauthorTan, Ling Ee
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorKim, Ryan Ryoung han
dc.contributor.orcidimecXu, Dongbo::0000-0003-1159-2315
dc.contributor.orcidimecGillijns, Werner::0000-0002-2430-7360
dc.contributor.orcidimecTan, Ling Ee::0000-0002-3143-5176
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.date.accessioned2023-03-23T13:10:15Z
dc.date.available2023-03-01T03:27:46Z
dc.date.available2023-03-02T09:06:16Z
dc.date.available2023-03-23T13:10:15Z
dc.date.embargo2022-11-25
dc.date.issued2022-11-25
dc.identifier.doi10.1117/1.JMM.21.4.043202
dc.identifier.issn1932-5150
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/41205
dc.publisherSPIE-SOC PHOTO-OPTICAL INSTRUMENTATION ENGINEERS
dc.source.beginpage043202-1
dc.source.endpage043202-16
dc.source.issue4
dc.source.journalJOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3
dc.source.numberofpages16
dc.source.volume21
dc.title

Extend 0.33 NA extreme ultraviolet single patterning to pitch 28-nm metal design by low-n mask

dc.typeJournal article
dspace.entity.typePublication
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