Publication:

Physical characterization of HfO2 deposited on Ge substrates by MOCVD

Date

2004

Proceedings Paper

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Files

9545.pdf 459.56 KB

Author(s)

Van Elshocht, Sven

;

;

;

Conard, Thierry

;

De Gendt, Stefan

;

Kubicek, Stefan

;

;

;

Richard, Olivier

;

;

Van Steenbergen, Jan

;

;

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Acq. date: 2025-12-16