Publication:

Physical characterization of HfO2 deposited on Ge substrates by MOCVD

Date

2004
Proceedings Paper
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dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorBrijs, Bert
dc.contributor.authorCaymax, Matty
dc.contributor.authorConard, Thierry
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorKubicek, Stefan
dc.contributor.authorMeuris, Marc
dc.contributor.authorOnsia, Bart
dc.contributor.authorRichard, Olivier
dc.contributor.authorTeerlinck, Ivo
dc.contributor.authorVan Steenbergen, Jan
dc.contributor.authorZhao, Chao
dc.contributor.authorHeyns, Marc
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorKubicek, Stefan
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorOnsia, Bart
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorVan Steenbergen, Jan
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.date.accessioned2021-10-15T16:59:31Z
dc.date.available2021-10-15T16:59:31Z
dc.date.embargo9999-12-31
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9743
dc.source.beginpage287
dc.source.conferenceHigh-Mobility Group-IV Materials and Devices
dc.source.conferencedate12/04/2004
dc.source.conferencelocationSan Fransisco, CA USA
dc.source.endpage292
dc.title

Physical characterization of HfO2 deposited on Ge substrates by MOCVD

dc.typeProceedings paper
dspace.entity.typePublication
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