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Metrology method for the correlation of line edge roughness for different resists before and after etch
Publication:
Metrology method for the correlation of line edge roughness for different resists before and after etch
Date
2000
Presentation
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Winkelmeier, Stephanie
;
Sarstedt, Margit
;
Ercken, Monique
;
Goethals, Mieke
;
Ronse, Kurt
Journal
Abstract
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1932
since deposited on 2021-10-14
Acq. date: 2025-10-23
Citations
Metrics
Views
1932
since deposited on 2021-10-14
Acq. date: 2025-10-23
Citations