Publication:

Process development for a novel low loss and non-PFAS photo imageable dielectric for RF silicon interposer applications

Date

2024

Proceedings Paper

https://doi.org/10.1109/3DIC63395.2024.10830178

Simple item page Full metadata Statistics

Author(s)

Jafarpoorchekab, Hamideh

;

;

;

Sinha, Siddhartha

;

;

;

Collaert, Nadine

Journal

N/A

Statistics

164 since deposited on 2025-06-21

8last month

2last week

Acq. date: 2026-02-24