Publication:
Optimizing i-line lithography for 0.3-μm poly-gate manufacturing
Date
| dc.contributor.author | Finders, Jo | |
| dc.contributor.author | Tzviatkov, Plamen | |
| dc.contributor.author | Ronse, Kurt | |
| dc.contributor.author | Van den hove, Luc | |
| dc.contributor.imecauthor | Ronse, Kurt | |
| dc.contributor.imecauthor | Van den hove, Luc | |
| dc.contributor.orcidimec | Ronse, Kurt::0000-0003-0803-4267 | |
| dc.date.accessioned | 2021-09-30T08:17:00Z | |
| dc.date.available | 2021-09-30T08:17:00Z | |
| dc.date.embargo | 9999-12-31 | |
| dc.date.issued | 1997 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/1883 | |
| dc.source.beginpage | S5 | |
| dc.source.endpage | S14 | |
| dc.source.issue | March | |
| dc.source.journal | Solid State Technology | |
| dc.source.volume | 40 | |
| dc.title | Optimizing i-line lithography for 0.3-μm poly-gate manufacturing | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | Original bundle
| |
| Publication available in collections: |