Publication:

Integrated 4-terminal single-contact nanoelectromechanical relays implemented in a silicon-on-insulator foundry process

Date

2023
Journal article
https://doi.org/10.1039/d3nr03429a
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dc.contributor.authorLi, Yingying
dc.contributor.authorWorsey, Elliott
dc.contributor.authorBleiker, Simon J.
dc.contributor.authorEdinger, Pierre
dc.contributor.authorKulsreshath, Mukesh Kumar
dc.contributor.authorTang, Qi
dc.contributor.authorTakabayashi, Alain Yuji
dc.contributor.authorQuack, Niels
dc.contributor.authorVerheyen, Peter
dc.contributor.authorBogaerts, Wim
dc.contributor.authorGylfason, Kristinn B.
dc.contributor.authorPamunuwa, Dinesh
dc.contributor.authorNiklaus, Frank
dc.contributor.imecauthorVerheyen, Peter
dc.contributor.imecauthorBogaerts, Wim
dc.contributor.orcidimecVerheyen, Peter::0000-0002-8245-9442
dc.contributor.orcidimecBogaerts, Wim::0000-0003-1112-8950
dc.date.accessioned2023-12-14T12:44:33Z
dc.date.available2023-11-02T17:41:36Z
dc.date.available2023-12-14T12:44:33Z
dc.date.embargo2023-10-31
dc.date.issued2023
dc.description.wosFundingTextSupport from the European Union & apos;s Horizon 2020 research and innovation program under grant agreement No. 780283 (MORPHIC) and No. 871740 (ZeroAMP) is gratefully acknowledged. The authors acknowledge the support of the EPFL Center of MicroNanoTechnology (CMi) for process steps performed at EPFL.
dc.identifier.doi10.1039/d3nr03429a
dc.identifier.issn2040-3364
dc.identifier.pmidMEDLINE:37856244
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/43063
dc.publisherROYAL SOC CHEMISTRY
dc.source.beginpage17335
dc.source.endpage17341
dc.source.issue43
dc.source.journalNANOSCALE
dc.source.numberofpages7
dc.source.volume15
dc.subject.keywordsRELIABILITY
dc.subject.keywordsTECHNOLOGY
dc.subject.keywordsDESIGN
dc.title

Integrated 4-terminal single-contact nanoelectromechanical relays implemented in a silicon-on-insulator foundry process

dc.typeJournal article
dspace.entity.typePublication
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