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Studies of the defectivity formation mechanismes between the top coats and the resists in immersion lithography
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Studies of the defectivity formation mechanismes between the top coats and the resists in immersion lithography
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Date
2005
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Stepanenko, Nickolay
;
Kishimura, Shinji
;
Gronheid, Roel
;
Maenhoudt, Mireille
;
Ercken, Monique
;
Kocsis, Michael
;
Vandenbroeck, Nadia
;
Van Den Heuvel, Dieter
;
Benndorf, Michael
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1939
since deposited on 2021-10-16
2
last month
Acq. date: 2025-12-09
Citations
Metrics
Views
1939
since deposited on 2021-10-16
2
last month
Acq. date: 2025-12-09
Citations