Chemical mechanical polishing of chemical vapor deposited Co films with minimal corrosion in the Cu/Co/Mn/SiCOH patterned structures

dc.contributor.author	Sagi, K.V.
dc.contributor.author	Teugels, Lieve
dc.contributor.author	van der Veen, Marleen
dc.contributor.author	Struyf, Herbert
dc.contributor.author	Alety, S.R.
dc.contributor.author	Babu, S.V.
dc.contributor.imecauthor	Teugels, Lieve
dc.contributor.imecauthor	van der Veen, Marleen
dc.contributor.imecauthor	Struyf, Herbert
dc.contributor.orcidimec	Teugels, Lieve::0000-0002-6613-9414
dc.contributor.orcidimec	van der Veen, Marleen::0000-0002-9402-8922
dc.date.accessioned	2021-10-24T12:39:23Z
dc.date.available	2021-10-24T12:39:23Z
dc.date.issued	2017
dc.identifier.issn	2162-8769
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/29348
dc.identifier.url	http://jss.ecsdl.org/content/6/5/P276.abstract
dc.source.beginpage	P276
dc.source.endpage	P283
dc.source.issue	5
dc.source.journal	ECS Journal of Solid State Science and Technology
dc.source.volume	6
dc.title	Chemical mechanical polishing of chemical vapor deposited Co films with minimal corrosion in the Cu/Co/Mn/SiCOH patterned structures
dc.type	Journal article
dspace.entity.type	Publication
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