Publication:

Millisecond flash lamp annealing of shallow implanted layers in Ge

Date

2009
Journal article
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dc.contributor.authorWündisch, C.
dc.contributor.authorPosselt, M.
dc.contributor.authorSchmidt, B.
dc.contributor.authorHeera, V.
dc.contributor.authorSchumann, T.
dc.contributor.authorMücklich, A.
dc.contributor.authorGrötzschel, R.
dc.contributor.authorSkorupa, W.
dc.contributor.authorClarysse, Trudo
dc.contributor.authorSimoen, Eddy
dc.contributor.authorHortenbach, H.
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.date.accessioned2021-10-18T05:27:16Z
dc.date.available2021-10-18T05:27:16Z
dc.date.embargo9999-12-31
dc.date.issued2009
dc.identifier.issn0003-6951
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16565
dc.source.beginpage252107
dc.source.issue25
dc.source.journalApplied Physics Letters
dc.source.volume95
dc.title

Millisecond flash lamp annealing of shallow implanted layers in Ge

dc.typeJournal article
dspace.entity.typePublication
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