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Conference contributions
Investigation of Low-n Mask in 0.33NA EUV Single Patterning at Pitch 28nm Metal Design
Publication:
Investigation of Low-n Mask in 0.33NA EUV Single Patterning at Pitch 28nm Metal Design
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Date
2022-05-26
Proceedings Paper
https://doi.org/10.1117/12.2614197
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Xu, Dongbo
;
Gillijns, Werner
;
Tan, Ling Ee
;
Philipsen, Vicky
;
Kim, Ryan Ryoung han
Journal
SPIE Conference proceedings
Abstract
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641
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1572
since deposited on 2022-09-19
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Acq. date: 2025-12-12
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Metrics
Downloads
641
since deposited on 2022-09-19
59
last month
10
last week
Acq. date: 2025-12-12
Views
1572
since deposited on 2022-09-19
1
last month
Acq. date: 2025-12-12
Citations