Publication:

Investigation of Low-n Mask in 0.33NA EUV Single Patterning at Pitch 28nm Metal Design

Date

2022-05-26
Proceedings Paper
https://doi.org/10.1117/12.2614197
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120510H.pdf 6.05 MB

Author(s)

Xu, Dongbo  
;
Gillijns, Werner  
;
Tan, Ling Ee  
;
Philipsen, Vicky  
;
Kim, Ryan Ryoung han

Journal

SPIE Conference proceedings

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727 since deposited on 2022-09-19
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1573 since deposited on 2022-09-19
Acq. date: 2026-02-24

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