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Conference contributions
Investigation of Low-n Mask in 0.33NA EUV Single Patterning at Pitch 28nm Metal Design
Publication:
Investigation of Low-n Mask in 0.33NA EUV Single Patterning at Pitch 28nm Metal Design
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Date
2022-05-26
Proceedings Paper
https://doi.org/10.1117/12.2614197
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Xu, Dongbo
;
Gillijns, Werner
;
Tan, Ling Ee
;
Philipsen, Vicky
;
Kim, Ryan Ryoung han
Journal
SPIE Conference proceedings
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Downloads
697
since deposited on 2022-09-19
39
last month
8
last week
Acq. date: 2026-01-26
Views
1573
since deposited on 2022-09-19
1
last month
1
last week
Acq. date: 2026-01-26
Citations