Publication:

Investigation of Low-n Mask in 0.33NA EUV Single Patterning at Pitch 28nm Metal Design

Date

2022-05-26
Proceedings Paper
https://doi.org/10.1117/12.2614197
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dc.contributor.authorXu, Dongbo
dc.contributor.authorGillijns, Werner
dc.contributor.authorTan, Ling Ee
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorKim, Ryan Ryoung han
dc.contributor.imecauthorXu, Dongbo
dc.contributor.imecauthorGillijns, Werner
dc.contributor.imecauthorTan, Ling Ee
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorKim, Ryan Ryoung han
dc.contributor.orcidimecXu, Dongbo::0000-0003-1159-2315
dc.contributor.orcidimecGillijns, Werner::0000-0002-2430-7360
dc.contributor.orcidimecTan, Ling Ee::0000-0002-3143-5176
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.date.accessioned2022-09-29T13:54:50Z
dc.date.available2022-09-19T02:51:15Z
dc.date.available2022-09-20T06:59:43Z
dc.date.available2022-09-29T13:54:50Z
dc.date.issued2022-05-26
dc.identifier.doi10.1117/12.2614197
dc.identifier.eisbn978-1-5106-4978-1
dc.identifier.isbn978-1-5106-4977-4
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/40460
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.beginpage120510H
dc.source.conferenceConference on Optical and EUV Nanolithography XXXV Part of SPIE Advanced Conference
dc.source.conferencedateAPR 24-MAY 27, 2022
dc.source.conferencelocationSan Jose, California, United States
dc.source.journalSPIE Conference proceedings
dc.source.numberofpages13
dc.source.volume12051
dc.title

Investigation of Low-n Mask in 0.33NA EUV Single Patterning at Pitch 28nm Metal Design

dc.typeProceedings paper
dspace.entity.typePublication
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