Publication:
e-beam Metrology for High-NA: Revisiting the imec Protocol
| dc.contributor.author | Lorusso, Gian Francesco | |
| dc.contributor.author | Moussa, Alain | |
| dc.contributor.author | Habashieh, Sahel | |
| dc.contributor.author | Van Den Heuvel, Dieter | |
| dc.contributor.author | Vangoidsenhoven, Diziana | |
| dc.contributor.author | Gupta, Mihir | |
| dc.contributor.author | Suh, Hyo Seon | |
| dc.contributor.author | Chen, Ying-Lin | |
| dc.contributor.author | De Simone, Danilo | |
| dc.contributor.author | Mack, Chris | |
| dc.contributor.author | Sun, Wei | |
| dc.contributor.author | Sugie, Masaki | |
| dc.contributor.author | Foubert, Philippe | |
| dc.contributor.author | Isawa, Miki | |
| dc.contributor.author | Charley, Anne-Laure | |
| dc.contributor.imecauthor | Lorusso, Gian Francesco | |
| dc.contributor.imecauthor | Moussa, Alain | |
| dc.contributor.imecauthor | Habashieh, Sahel | |
| dc.contributor.imecauthor | Van den Heuvel, Dieter | |
| dc.contributor.imecauthor | Vangoidsenhoven, Diziana | |
| dc.contributor.imecauthor | Gupta, Mihir | |
| dc.contributor.imecauthor | Suh, Hyo Seon | |
| dc.contributor.imecauthor | Chen, Ying-Lin | |
| dc.contributor.imecauthor | De Simone, Danilo | |
| dc.contributor.imecauthor | Foubert, Philippe | |
| dc.contributor.imecauthor | Charley, Anne-Laure | |
| dc.contributor.orcidimec | Moussa, Alain::0000-0002-6377-4199 | |
| dc.contributor.orcidimec | Van Den Heuvel, Dieter::0009-0008-6879-2178 | |
| dc.contributor.orcidimec | Gupta, Mihir::0000-0003-0286-7997 | |
| dc.contributor.orcidimec | Suh, Hyo Seon::0000-0003-4370-5062 | |
| dc.contributor.orcidimec | Chen, Ying-Lin::0000-0003-1283-0258 | |
| dc.contributor.orcidimec | De Simone, Danilo::0000-0003-3927-5207 | |
| dc.contributor.orcidimec | Charley, Anne-Laure::0000-0003-4745-0167 | |
| dc.date.accessioned | 2025-07-28T03:57:58Z | |
| dc.date.available | 2025-07-28T03:57:58Z | |
| dc.date.issued | 2025 | |
| dc.description.wosFundingText | This work has been enabled in part by the NanoIC pilot line. The acquisition and operation are jointly funded by the Chips Joint Undertaking, through the European Union's Digital Europe (101183266) and Horizon Europe programs (101183277), as well as by the participating states Belgium (Flanders), France, Germany, Finland, Ireland and Romania. | |
| dc.identifier.doi | 10.1117/12.3052366 | |
| dc.identifier.eisbn | 978-1-5106-8639-7 | |
| dc.identifier.isbn | 978-1-5106-8638-0 | |
| dc.identifier.issn | 0277-786X | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/45962 | |
| dc.publisher | SPIE-INT SOC OPTICAL ENGINEERING | |
| dc.source.beginpage | 134260L-1 | |
| dc.source.conference | 2025 Conference on Metrology Inspection and Process Control-Annual | |
| dc.source.conferencedate | 2025-02-24 | |
| dc.source.conferencelocation | San Jose | |
| dc.source.endpage | 134260L-13 | |
| dc.source.journal | Proceedings of SPIE | |
| dc.source.numberofpages | 13 | |
| dc.title | e-beam Metrology for High-NA: Revisiting the imec Protocol | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
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