Publication:

EUV resist contrast loss determination using interference lithography

Date

2009
Proceedings Paper
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dc.contributor.authorLangner, Andreas
dc.contributor.authorSolak, Harun H.
dc.contributor.authorAuzelyte, Vaida
dc.contributor.authorEkinci, Yasin
dc.contributor.authorDavid, Christian
dc.contributor.authorGobrecht, Jens
dc.contributor.authorGronheid, Roel
dc.contributor.authorvan Setten, Eelco
dc.contributor.authorvan Ingen Schenau, Koen
dc.contributor.authorFeenstra, Kees
dc.contributor.imecauthorGronheid, Roel
dc.date.accessioned2021-10-17T23:43:43Z
dc.date.available2021-10-17T23:43:43Z
dc.date.embargo9999-12-31
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15651
dc.source.conferenceInternational Symposium on Extreme Ultraviolet Lithography
dc.source.conferencedate18/10/2009
dc.source.conferencelocationPrague Czech Republic
dc.title

EUV resist contrast loss determination using interference lithography

dc.typeProceedings paper
dspace.entity.typePublication
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