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Addressing key concerns for implementation of Ni FUSI into manufacturing for 45/32 nm CMOS
Publication:
Addressing key concerns for implementation of Ni FUSI into manufacturing for 45/32 nm CMOS
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Date
2007
Proceedings Paper
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Shickova, Adelina
;
Kauerauf, Thomas
;
Rothschild, Aude
;
Aoulaiche, Marc
;
Sahhaf, Sahar
;
Kaczer, Ben
;
Veloso, Anabela
;
Torregiani, Cristina
;
Pantisano, Luigi
;
Lauwers, Anne
;
Zahid, Mohammed
;
Rost, Tim
;
Tigelaar, H.
;
Pas, M.
;
Fretwell, J.
;
McCormack, J.
;
Hoffmann, Thomas
;
Kerner, Christoph
;
Chiarella, Thomas
;
Brus, Stephan
;
Harada, Yoshinao
;
Niwa, Masaaki
;
Kaushik, Vidya
;
Maes, Herman
;
Absil, Philippe
;
Groeseneken, Guido
;
Biesemans, Serge
;
Kittl, Jorge
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1957
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Acq. date: 2026-01-25
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Statistics
Views
1957
since deposited on 2021-10-16
1
last month
Acq. date: 2026-01-25
Citations