Publication:
Addressing key concerns for implementation of Ni FUSI into manufacturing for 45/32 nm CMOS
Date
| dc.contributor.author | Shickova, Adelina | |
| dc.contributor.author | Kauerauf, Thomas | |
| dc.contributor.author | Rothschild, Aude | |
| dc.contributor.author | Aoulaiche, Marc | |
| dc.contributor.author | Sahhaf, Sahar | |
| dc.contributor.author | Kaczer, Ben | |
| dc.contributor.author | Veloso, Anabela | |
| dc.contributor.author | Torregiani, Cristina | |
| dc.contributor.author | Pantisano, Luigi | |
| dc.contributor.author | Lauwers, Anne | |
| dc.contributor.author | Zahid, Mohammed | |
| dc.contributor.author | Rost, Tim | |
| dc.contributor.author | Tigelaar, H. | |
| dc.contributor.author | Pas, M. | |
| dc.contributor.author | Fretwell, J. | |
| dc.contributor.author | McCormack, J. | |
| dc.contributor.author | Hoffmann, Thomas | |
| dc.contributor.author | Kerner, Christoph | |
| dc.contributor.author | Chiarella, Thomas | |
| dc.contributor.author | Brus, Stephan | |
| dc.contributor.imecauthor | Sahhaf, Sahar | |
| dc.contributor.imecauthor | Kaczer, Ben | |
| dc.contributor.imecauthor | Veloso, Anabela | |
| dc.contributor.imecauthor | Lauwers, Anne | |
| dc.contributor.imecauthor | Kerner, Christoph | |
| dc.contributor.imecauthor | Chiarella, Thomas | |
| dc.contributor.imecauthor | Brus, Stephan | |
| dc.contributor.imecauthor | Absil, Philippe | |
| dc.contributor.imecauthor | Groeseneken, Guido | |
| dc.contributor.imecauthor | Biesemans, Serge | |
| dc.contributor.orcidimec | Kaczer, Ben::0000-0002-1484-4007 | |
| dc.contributor.orcidimec | Chiarella, Thomas::0000-0002-6155-9030 | |
| dc.date.accessioned | 2021-10-16T19:41:50Z | |
| dc.date.available | 2021-10-16T19:41:50Z | |
| dc.date.embargo | 9999-12-31 | |
| dc.date.issued | 2007 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/12893 | |
| dc.source.beginpage | 158 | |
| dc.source.conference | Symposium on VLSI. Technology Digest of Technical Papers | |
| dc.source.conferencedate | 14/06/2007 | |
| dc.source.conferencelocation | Kyoto Japan | |
| dc.source.endpage | 159 | |
| dc.title | Addressing key concerns for implementation of Ni FUSI into manufacturing for 45/32 nm CMOS | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | Original bundle
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| Publication available in collections: | ||