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Sputter yield and stoichiometry study of InGaZnO film in ion beam etching
Publication:
Sputter yield and stoichiometry study of InGaZnO film in ion beam etching
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Date
2025-MAY
Journal article
https://doi.org/10.1116/6.0004243
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Li, Jie
;
Kundu, Shreya
;
Souriau, Laurent
;
Lazzarino, Frederic
;
Devriendt, Katia
Journal
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
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157
since deposited on 2025-03-31
Acq. date: 2026-01-06
Citations
Metrics
Views
157
since deposited on 2025-03-31
Acq. date: 2026-01-06
Citations