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Design correction in extreme ultrviolet lithography
Publication:
Design correction in extreme ultrviolet lithography
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Date
2010-10
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Fenger, Germain
;
Lorusso, Gian
;
Hendrickx, Eric
;
Niroomand, Ardavan
Journal
Journal of Micro/Nanolithography MEMS and MOEMS
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1873
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Acq. date: 2025-12-11
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Metrics
Views
1873
since deposited on 2021-10-18
1
last month
Acq. date: 2025-12-11
Citations