Skip to content
Institutional repository
Communities & Collections
Browse all items
Scientific publications
Open knowledge
Log In
imec Publications
Conference contributions
Characterization of 248nm deep ultraviolet (DUV) photoresist after ion implantation
Publication:
Characterization of 248nm deep ultraviolet (DUV) photoresist after ion implantation
Copy permalink
Date
2009
Meeting abstract
Simple item page
Full metadata
Statistics
Loading...
Loading...
Files
18426.pdf
226.11 KB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Tsvetanova, Diana
;
Vos, Rita
;
Vereecke, Guy
;
Clemente, Francesca
;
Vanstreels, Kris
;
Conard, Thierry
;
Parac-Vogt, Tatjana
;
Mertens, Paul
;
Heyns, Marc
Journal
Abstract
Description
Metrics
Views
1893
since deposited on 2021-10-18
1
last month
1
last week
Acq. date: 2025-12-11
Citations
Metrics
Views
1893
since deposited on 2021-10-18
1
last month
1
last week
Acq. date: 2025-12-11
Citations