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Characterization of 248nm deep ultraviolet (DUV) photoresist after ion implantation
Publication:
Characterization of 248nm deep ultraviolet (DUV) photoresist after ion implantation
Date
2009
Meeting abstract
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18426.pdf
226.11 KB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Tsvetanova, Diana
;
Vos, Rita
;
Vereecke, Guy
;
Clemente, Francesca
;
Vanstreels, Kris
;
Conard, Thierry
;
Parac-Vogt, Tatjana
;
Mertens, Paul
;
Heyns, Marc
Journal
Abstract
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1891
since deposited on 2021-10-18
Acq. date: 2025-10-23
Citations
Metrics
Views
1891
since deposited on 2021-10-18
Acq. date: 2025-10-23
Citations