Publication:

Characterization of 248nm deep ultraviolet (DUV) photoresist after ion implantation

Date

2009
Meeting abstract
Simple item page Full metadata Statistics
 
dc.contributor.authorTsvetanova, Diana
dc.contributor.authorVos, Rita
dc.contributor.authorVereecke, Guy
dc.contributor.authorClemente, Francesca
dc.contributor.authorVanstreels, Kris
dc.contributor.authorConard, Thierry
dc.contributor.authorParac-Vogt, Tatjana
dc.contributor.authorMertens, Paul
dc.contributor.authorHeyns, Marc
dc.contributor.imecauthorTsvetanova, Diana
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorVanstreels, Kris
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.contributor.orcidimecVanstreels, Kris::0000-0002-4420-0966
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.date.accessioned2021-10-18T03:46:00Z
dc.date.available2021-10-18T03:46:00Z
dc.date.embargo9999-12-31
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16329
dc.source.beginpage2077
dc.source.conference216th ECS Meeting
dc.source.conferencedate4/10/2009
dc.source.conferencelocationVienna Austria
dc.title

Characterization of 248nm deep ultraviolet (DUV) photoresist after ion implantation

dc.typeMeeting abstract
dspace.entity.typePublication
Files

Original bundle

Name:
18426.pdf
Size:
226.11 KB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Conference contributions