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Influence of hardware and chemistry on the removal of nano-particles in a megasonic cleaning tank

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dc.contributor.authorVereecke, Guy
dc.contributor.authorVos, Rita
dc.contributor.authorHolsteyns, Frank
dc.contributor.authorSchmidt, M.O.
dc.contributor.authorBaeyens, Martien
dc.contributor.authorGomme, Steven
dc.contributor.authorSnow, Jim
dc.contributor.authorCoenen, V.
dc.contributor.authorMertens, Paul
dc.contributor.authorBauer, T.
dc.contributor.authorHeyns, Marc
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.date.accessioned2021-10-15T07:39:15Z
dc.date.available2021-10-15T07:39:15Z
dc.date.embargo9999-12-31
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8367
dc.source.beginpage143
dc.source.conferenceUltra Clean Processing of Silicon Surfaces 2002 - UCPSS
dc.source.conferencedate16/09/2002
dc.source.conferencelocationOostende Belgium
dc.source.endpage147
dc.title

Influence of hardware and chemistry on the removal of nano-particles in a megasonic cleaning tank

dc.typeProceedings paper
dspace.entity.typePublication
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