Publication:

Low-temperature Ge and GeSn chemical vapor deposition using Ge2H6

Date

2012
Journal article
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dc.contributor.authorGencarelli, Federica
dc.contributor.authorVincent, Benjamin
dc.contributor.authorSouriau, Laurent
dc.contributor.authorRichard, Olivier
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorLoo, Roger
dc.contributor.authorCaymax, Matty
dc.contributor.authorHeyns, Marc
dc.contributor.imecauthorVincent, Benjamin
dc.contributor.imecauthorSouriau, Laurent
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecSouriau, Laurent::0000-0002-5138-5938
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.date.accessioned2021-10-20T11:10:20Z
dc.date.available2021-10-20T11:10:20Z
dc.date.embargo9999-12-31
dc.date.issued2012
dc.identifier.issn0040-6090
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20715
dc.identifier.urlhttp://dx.doi.org/10.1016/j.tsf.2011.10.119
dc.source.beginpage3211
dc.source.endpage3215
dc.source.issue8
dc.source.journalThin Solid Films
dc.source.volume520
dc.title

Low-temperature Ge and GeSn chemical vapor deposition using Ge2H6

dc.typeJournal article
dspace.entity.typePublication
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