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Electrical and physical characterization of high-k dielectric layers

Date

2001
Proceedings Paper
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dc.contributor.authorHoussa, Michel
dc.contributor.authorNaili, Mohamed
dc.contributor.authorAfanas'ev, V. V.
dc.contributor.authorHeyns, Marc
dc.contributor.authorStesmans, Andre
dc.contributor.imecauthorHoussa, Michel
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorStesmans, Andre
dc.contributor.orcidimecHoussa, Michel::0000-0003-1844-3515
dc.date.accessioned2021-10-14T17:03:02Z
dc.date.available2021-10-14T17:03:02Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5350
dc.source.beginpage196
dc.source.conferenceInternational Symposium on VLSI Technology, Systems, and Applications. Proceedings of Technical Papers
dc.source.conferencedate18/04/2001
dc.source.conferencelocationHsinchu Japan
dc.source.endpage199
dc.title

Electrical and physical characterization of high-k dielectric layers

dc.typeProceedings paper
dspace.entity.typePublication
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