A novel self-aligned double patterning integrated with Ga+ focused ion beam milling for silicon nanowire definition

Author(s)

Rosa, Andressa Macedo

;

;

de Souza, Lais Oliveira

;

Barbosa Lima, Lucas Petersen

;

Puydinger dos Santos, Marcos Vinicius

;

Manera, Leandro Tiago

;

Diniz, Jose Alexandre

MICROELECTRONIC ENGINEERING

1809 since deposited on 2021-11-02

1last week

Acq. date: 2025-11-01