Publication:

A novel self-aligned double patterning integrated with Ga+ focused ion beam milling for silicon nanowire definition

Date

2021

Journal article

https://doi.org/10.1016/j.mee.2020.111493

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Author(s)

Rosa, Andressa Macedo

;

Leonhardt, Alessandra

;

de Souza, Lais Oliveira

;

Barbosa Lima, Lucas Petersen

;

Puydinger dos Santos, Marcos Vinicius

;

Manera, Leandro Tiago

;

Diniz, Jose Alexandre

Journal

MICROELECTRONIC ENGINEERING

Metrics

1809 since deposited on 2021-11-02

Acq. date: 2025-12-15